Azora™ Photochemical Filter

Groundbreaking filtration media developed to improve critical photochemical performance in bulk chemical and point-of-use filtration applications.

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Eximore SV1 Filter

Advanced clean, point-of-use filter designed for NTD and RRC solvents.

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Eximore SV1 Filter Flushing Shell

Transitional photochemical dispense system flow-through-device

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Eximore SV5 Filter

Advanced clean, point-of-use filter designed for NTD and RRC solvents.

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FlowPlane™ Linear Filtration Technology

Best-in-class linear filtration technology enabling greatly increased flow rate and superior contaminant retention capabilities in sub 45 nm technology nodes.

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Fluorogard® AT Filter

Clean, cost-effective filtration of non-outgassing, aqueous, acid and base chemistries or advanced solvent applications.

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Fluorogard FP/FP-HP Filter

Point-of-tool, DI water filter with strong contaminant and metal ion retention and good flow-rate performance in greater than 180 nm technology nodes.

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Fluorogard® NX Filter

Clean, cost-effective filtration of non-outgassing, aqueous, acid and base chemistries or advanced solvent applications.

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Fluorogard® PE Filters

Clean, all-purpose bulk chemical filter

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Fluoroline™ S Filter

Small volume, point of dispense acid, base and solvent filter

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Impact® 2 Filter Manifold (8G, 2-V2)

Transitional photochemical dispense system flow-through-device for use with Impact® point-of-use filters.

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Impact 2 V2 Filter

Clean, point-of-use photochemical filter with robust flow rate performance and reduced microbubble formation capabilities.

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Impact® 8G Filter

Best-in-class, ultra-clean, point-of-use photochemical filter, delivering superior flow rate performance and reduced microbubble formation capabilities in sub 28 nm technology nodes.  Impact 8G features Oktolex™ membrane technology for use in EUV, ArF, and KrF lithography for 3D NAND, Logic and DRAM devices.

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Impact® Mini Filter

Point of dispense, low hold up volume photochemical filter

Microgard™ Plus/Plus LE/LE Nylon Filter

Clean, solvent-based, bulk photochemical filter

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Microgard™ UC Filter

Clean, high-throughput filtration for bulk photochemical manufacturing and solvent applications.

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Microgard™ UPE/UPX Filter

Solvent-based, bulk photochemical filter with high flow rate performance and contaminant retention capabilities in 45 – 180 nm technology nodes.

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Optimizer® AT Photochemical Filter

Advanced, point-of-dispense and point-of-tool filtration specially designed for organic solvent and aggressive solvent applications.

• Highly retentive PTFE membrane enables reduced particle shedding, low metal and organic extractables
• Long capsule format enhances flow rate performance for increased process yields and shorter filter startup intervals

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Optimizer® D Filter

Point-of-use photochemical filter with superior contaminant retention and low hold-up volume performance in sub-10 – 180 nm technology nodes.

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Optimizer® DEV Filter

Optimizer DEV disposable liquid photochemical filters are designed for developer, DI water, and solvent applications in POU photolithography processes.

• Use a capsule form factor that enables high purity with minimal contamination with higher flow rate and strong retention rate performance in 28 – 65 nm technology nodes
• These filters occupy less space for filter changeouts because no manifolds are needed
• Integrated polypropylene housing minimizes downtime and limits hazardous chemical handling during installation
• The disposable filter, with surface-modified UPE membrane, achieves maximum flow with minimal risk of microbubble formation

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Optimizer® DI Filters

Liquid photochemical filters designed for DI water applications in point-of-use (PoU) photolithography processes. The small capsule form factor and clean membrane/support/shell materials provide high purity contamination removal performance in > 28 nm nodes applications.

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Optimizer® ST Filter

Optimizer® point-of-use (POU) DI water and photochemical solvent filters deliver high-purity filtration to photolithography processes.

• Provide higher flow rate and strong retention rate performance in all technology nodes
• Use our Connectology® technology to quickly connect and seal with compatible manifolds
• Easy to install or retrofit, the compact design saves space and enables faster startup with minimal exposure to process chemicals
• The hydrophilic filter, wth pleated UPE membrane, achieves maximum flow with minimal risk of contamination

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Optimizer® ST2 Filter Manifold

Transitional photochemical dispense system flow-through-device for use with Optimizer® point-of-use filters. The ST2 model provides higher flow rate and standard cleanliness in all technology nodes.

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Panelgard™ Ex Filter

Bulk, general use chemical filter with ultra-high flow rate performance in flat panel display applications.

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Panelgard™ PDP 1-2-3 and 1-2-3 Filter

Point of tool, photochemical and solvent filter with high flow rate and good contaminant retention performance in flat panel display color filter/resist and photolithography applications.

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ProcessGard® PES/PP/PS Filters

Point-of-use, solvent, DI water, and dilute acid/base filters with high flow rate and good contaminant retention performance in microelectronic cleaning applications.

• PES cartridge and disposable filters are high-flow, longer lifetime filters ideally suited for weak acid,  base, and ultrapure DI water filtration
• PP cartridge and disposable filters are ideally suited for acid, base, process water, solvent, dye, and lacquer filtration in flat panel display and chemical manufacturing
• PS high-retention filters for final cleaning and ultrapure DI water processes
• Various retention ratings, fittings sizes, and types to meet various requirements

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Protego® Plus IPA Purifier

High-efficiency solvent purifier/filters providing superior metal and particle removal for critical gate-cleaning (FEOL) applications in sub 45 nm technology nodes.

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Pumpgard™ II Filter

Pre-filtration device to prevent wafer shards from damaging downstream valves, dispense systems, final filters and other chemical analysis devices.

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Purasol™ SP/SN Solvent Purifiers

Purasol™ solvent purifiers are the best-in-class solutions for ultraclean chemical and raw material manufacturers. Using uniquely tailored membrane technology, the versatile purifier can efficiently remove both dissolved and colloidal metal contaminants from a wide variety of ultrapure, polar and non-polar solvents including difficult to remove ketones like Cyclohexanone.   

• Reduces metal-induced defects
• Single or subpart-per-trillion contaminant removal performance
• UPE membrane material for ultraclean performance

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QuickChange® NX Filter

Advanced filtration of aqueous, outgassing, and aggressive acid and base chemistries in 28 nm or greater technology nodes. Enables high flow rate and retention performance.

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Savana® Lab Disc Filter

For clarification of acids, bases and solvents, these filters offer scalability as your volume and filtrations needs change.

• Media disc diameter ranging from 13 to 142 mm
• Available in 5 media materials

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Savana® Lab IJ Disc Filter

R&D Lab-scale, ink and photosensitive material filter with good contaminant retention and low hold-up-volume performance in semiconductor, flat panel display, and life science applications.

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Savana® PP Filter

Point-of-tool, general use filter with high flow rate and good contaminant retention performance in flat panel display, data storage and chemical manufacturing applications.

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Savana® PTFE Filter

Point of tool and point-of-dispense solvent, DI water and dilute acid/base filter with good contaminant retention performance in microelectronic, life science and water treatment cleaning applications.

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Savana® Semiconductor Lab Disc Disposable Filter

R&D filtration solution to enable all-purpose chemical design and manufacturing scale-up in all technology nodes.

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Torrento® S Filter

Best-in-class, leading-edge filtration of solvents and BEOL chemistries in sub 22 nm technology nodes. Enables high flow rate and retention performance.

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