Contamination Control Technologies for Chemicals, Water, Solvents and Photochemicals
Controlling contaminants in process streams is a vital way to improve operating efficiency and enable technology advances. Entegris offers a variety of membrane and media to match the chemical compatibility and process conditions of each manufacturing environment.
Best-in-class, ultra-clean, point-of-use photochemical filter, delivering superior flow rate performance and reduced microbubble formation capabilities in sub 28 nm technology nodes. Impact 8G features Oktolex™ membrane technology for use in EUV, ArF, and KrF lithography for 3D NAND, Logic and DRAM devices.
Liquid photochemical filters designed for DI water applications in point-of-use (PoU) photolithography processes. The small capsule form factor and clean membrane/support/shell materials provide high purity contamination removal performance in > 28 nm nodes applications.
Purasol™ solvent purifiers are the best-in-class solutions for ultraclean chemical and raw material manufacturers. Using uniquely tailored membrane technology, the versatile purifier can efficiently remove both dissolved and colloidal metal contaminants from a wide variety of ultrapure, polar and non-polar solvents including difficult to remove ketones like Cyclohexanone.
Reduces metal-induced defects
Single or subpart-per-trillion contaminant removal performance
Point of tool and point-of-dispense solvent, DI water and dilute acid/base filter with good contaminant retention performance in microelectronic, life science and water treatment cleaning applications.
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