Best-in-class, bulk slurry filter with ultra-high particle loading capacity for bulk processes in sub 45 nm technology nodes. Enables superior hard particle removal and gel retention performance to prevent micro scratches.
Point-of-dispense filter designed to handle low-concentration, small abrasive and ceria-based slurries in 65 nm or greater technology nodes to prevent micro-scratches. Enables good flow rate performance and increased filter lifetime.
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