Entegris Gas Purifiers

GateKeeper® GPU Gas Purifiers

OUR GPU GAS PURIFIERS EFFICIENTLY REMOVE HALOGENATED GASES, HYDRIDES, REACTIVE OXIDES, SATURATED AND UNSATURATED HYDROCARBONS, FLUOROCARBONS, AND CHLOROCARBONS AT A VARIETY OF FLOW RATES.

Purity to PPT levels
Wide range of gas compatibility, including corrosive gases such as Cl2, HBr, HCl, CF4, SO2, SF6
The low-pressure drop across the purifier
CE certified to the pressure equipment directive PED and manufactured in an ISO 9001-2000 facility
Regenerable – eliminates disposal issues and costs
Long lifetime – improved cost of ownership
Use ambient temperature purification

GateKeeper® GPU Ozone Gas Purifiers

OUR ADVANCED GAS PURIFICATION TECHNOLOGY EFFICIENTLY REDUCES SOLID AND VOLATILE METALS SUCH AS CHROMIUM (CR) AND MANGANESE (MN) FROM OZONE GAS.

Advanced gas purification technology enables a >99% volatile efficiency removal rating for Cr, significantly reducing the conditioning time required for the ozone gas delivery system
Integrated PTFE/PFA filter removes particles immediately after media purification, reducing wafer particles and eliminating the need for an independent filter
Compact, in-line design with gasket seal enables fast, easy installation

GateKeeper® HGU Heated Getter Gas Purifiers

THESE PS2, PS3, PS4 HEATED GETTER GAS PURIFIERS UTILIZES THE ONLY PURIFIER TECHNOLOGY CAPABLE OF REMOVING ALL HYDROCARBONS AND NITROGEN FROM PROCESS GASES.

Point-of-use (POU) gas purification ensures consistent and repeatable process performance, isolates critical process areas from house gas distribution systems, and protects against gas purity upsets and cross-contamination
Provides the most complete removal of impurities for rare gases, nitrogen (N2), and hydrogen (H2), with high reliability, low cost, and high performance
The heated getter material forms irreversible chemical bonds with any oxide, carbide, and nitride impurities
The optimized design provides sub-ppb performance, which is better than gas from a cylinder or liquid sources, in small footprints with flow rates up to 150 slpm (9 Nm3/hr)

GateKeeper® HGU Heated Catalyst XCDA®, Oxygen Gas Purifiers

THESE PS15 HEATED CATALYST GAS PURIFIERS EFFICIENTLY REMOVE NUMEROUS IMPURITIES WITH HIGH RELIABILITY, LOW COST, AND HIGH PERFORMANCE.

Uses a catalytic oxidation purification process for reducing total hydrocarbons (THC), carbon monoxide (CO), and hydrogen (H2), which are converted to carbon dioxide (CO2) and water (H2O)
Designed for continuous, uninterrupted operation, without consumable components
Under normal use, there is no need to ever replace or regenerate the purification column, allowing for simple installation and operation
Optimized design provides sub-ppb performance in small footprints with flow rates up to 100 slpm (6 Nm3/hr)

Chacollet™ In-line Hydrocarbon Purifiers

CHACOLLET™ IN-LINE HYDROCARBON PURIFIERS. COST-EFFECTIVE HYDROCARBON REMOVAL IN LITHOGRAPHY APPLICATIONS.

Removes purge-gas impurities like CDA, N2, Ar and He.
Excellent initial cleanliness.
Maintains high retention in Hydrocarbons (>C6).
Can be used at ambient temperature without power or heat.
Various models for various flow rates.

Luminousgard™ Gas Purifiers

THESE POINT-OF-USE, IN-LINE GAS PURIFIERS EFFECTIVELY REMOVES HYDROCARBONS, ACID AND BASE IMPURITIES, AND PARTICLES IN LITHOGRAPHY APPLICATIONS.

Removes impurities in CDA, N2, Ar, and He gases.
Excellent initial cleanliness.
Effectively removes particles in gas stream.
Can be used without power.
Various models for various flow rate.

GateKeeper® HX Series Gas Purification Systems

GATEKEEPER® HX SERIES – GASES PURIFIED: HYDROGEN (H2), NITROGEN (N2) OR ARGON (AR). CONTINUOUS FLOW, POINT-OF-USE PURIFIED HYDROGEN, NITROGEN OR ARGON GAS AT A LOW COST OF OWNERSHIP.

Removes contaminants such as H2O, O2 and more.
Ensures cleaner process in parts-per-million levels.
Power failures will not harm the system.
Purifiers automatically self-regenerate.
Uses minimal fab floor space to save costs.

GateKeeper® EX Series Gas Purification Systems

GATEKEEPER® DX SERIES – GASES PURIFIED: CARBON DIOXIDE (CO2). CONTINUOUS FLOW, POINT-OF-USE PURIFIED CO2 GAS AT A LOW COST OF OWNERSHIP.

DX series systems remove volatile acids and bases.
Ensures cleaner process in parts-per-million levels.
Power failures will not harm the system.
Purifiers automatically self-regenerate.
Uses minimal fab floor space to save costs.
Photolithography

GateKeeper® DX Series Gas Purification Systems

THE GATEKEEPER® GAS PURIFICATION SYSTEM (GPS) EX SERIES IS THE LATEST CONTINUOUS SERVICE GAS PURIFICATIONS SYSTEM FROM ENTEGRIS. THIS ADVANCED GAS PURIFICATION TECHNOLOGY PROVIDES SEMICONDUCTOR MANUFACTURERS WITH AN INNOVATIVE, EFFICIENT AND COST EFFECTIVE SOLUTION TO PURIFY PURGE GASES USED IN A DRY AND IMMERSION-BASED LITHOGRAPHY TOOLS.

Purifies to ppt (parts-per-trillion) levels.
Low-pressure drop resulting in no changes to inlet pressure required.
Self-regenerating purifiers.
Low cost of ownership.
Ambient temperature purification.
Power failure will not damage purification system.

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GateKeeper® SX Series Gas Purification Systems

GATEKEEPER® GAS PURIFICATION SYSTEM (GPS) SX SERIES IS THE LATEST CONTINUOUS SERVICE GAS PURIFICATION SYSTEM FROM ENTEGRIS. THIS ADVANCED GAS PURIFICATION TECHNOLOGY PROVIDES SEMICONDUCTOR MANUFACTURERS WITH AN INNOVATIVE, EFFICIENT AND COST EFFECTIVE SOLUTION.

Purifies to part-per-billion (ppb) levels.
Low pressure resulting in no changes to inlet pressure required.
Self-regenerating purifiers.
Low cost of ownership.
Ambient temperature purification for low energy costs and resource conservation.
Power failure will not damage the purification system.

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GateKeeper® Z3 Series Gas Purification Systems

THE GATEKEEPER® GAS PURIFICATION SYSTEM (GPS) Z3 SERIES IS THE LATEST CONTINUOUS SERVICE GAS PURIFICATIONS SYSTEM FROM ENTEGRIS. THIS ADVANCED GAS PURIFICATION TECHNOLOGY PROVIDES SEMICONDUCTOR MANUFACTURERS WITH AN INNOVATIVE, EFFICIENT AND COST EFFECTIVE SOLUTION TO PURIFY PURGE GASES USED IN A DRY AND IMMERSION-BASED LITHOGRAPHY TOOLS.

Purifies to ppt (parts-per-trillion) levels.
Low-pressure drop resulting in no changes to inlet pressure required.
Self-regenerating purifiers.
Low cost of ownership.
Ambient temperature purification.
Power failure will not damage the purification system.

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GateKeeper® Z2 Series Gas Purification Systems

GATEKEEPER® Z2 SERIES – GASES PURIFIED: CDA (AIR). CONTINUOUS FLOW, POINT-OF-USE XCDA® PURGE GAS AT A LOW COST OF OWNERSHIP.

Z2 series systems remove contaminants from CDA (air) gas.
Ensures cleaner process in parts-per-trillion levels.
Power failures will not harm the system.
Purifiers automatically self-regenerate.
Uses minimal fab floor space to save costs.

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MegaTorr® Auto Regenerable Nitrogen Gas Purifiers

THESE PS8 BULK GAS PURIFIERS EFFICIENTLY REMOVE NUMEROUS IMPURITIES WITH HIGH RELIABILITY, LOW COST, AND HIGH PERFORMANCE.

Uses dual adsorption processes designed specifically to provide ultra-high purity gas for semiconductor applications.
Two adsorber vessels alternate between purify and regeneration modes, providing continuous purification.
Adsorber regeneration is accomplished by back flushing with a mixture of purified process gas and low concentration hydrogen (H2) at an elevated temperature.
Optimized design provides sub-ppb performance in small footprints with flow rates up to 833,333 slpm (50,000 Nm3/hr).

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MegaTorr® Auto Regenerable Hydrogen Gas Purifiers

THESE PS7-A BULK GAS PURIFIERS EFFICIENTLY REMOVE NUMEROUS IMPURITIES WITH HIGH RELIABILITY, LOW COST, AND HIGH PERFORMANCE.

Uses catalytic and adsorption processes to provide ultra-high purity hydrogen (H2) gas for semiconductor applications.
Two adsorber vessels alternate between purifying and regeneration modes, providing continuous purification.
Adsorber regeneration is accomplished by back flushing with purified H2 at an elevated temperature.
The optimized design provides sub-ppb performance in small footprints with flow rates up to 16,667 slpm (1,000 Nm3/hr).

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MegaTorr® Auto Regenerable Ammonia Gas Purifiers

THESE PS21 AUTOMATICALLY REGENERABLE, BULK GAS PURIFIERS EFFICIENTLY REMOVE NUMEROUS IMPURITIES WITH HIGH RELIABILITY, LOW COST, AND HIGH PERFORMANCE.

Uses adsorption processes designed specifically to provide ultra-high purity gas for semiconductor applications.
Two adsorber vessels alternate between purify and regeneration modes, providing continuous purification in a single process.
Adsorber regeneration is accomplished by back flushing with a mixture of purified nitrogen (N2) and low concentration hydrogen (H2) at an elevated temperature, then the regenerated vessel is reconditioned with ammonium (NH3) prior to placing it back into service.
Optimized design provides sub-ppb performance in small footprints with flow rates up to 1,667 slpm (100 Nm3/hr).

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MegaTorr® Heated Getter Gas Purifiers

THESE PS5 HELIUM/ARGON BULK GAS PURIFIERS EFFICIENTLY REMOVE NUMEROUS IMPURITIES WITH HIGH RELIABILITY, LOW COST, AND HIGH PERFORMANCE.

Patented getter alloy operates at elevated temperatures to remove impurities by forming irreversible chemical bonds.
Designed to last multiple years; once a column is consumed it can be replaced with a new column, for a new lifetime.
Downstream of the heated getter columns, hydrogen (H2) impurities are removed by a patented secondary ambient temperature getter cartridge, known as the Hydrogen Removal Unit (HRU).
Comes standard with GettSafe™ fast response thermal protection, which quickly detects excessive heat in the getter column and takes action to isolate the purifier.
Optimized design provides sub-ppb performance in small footprints with one meter front/rear access and flow rates up to 5,833 slpm (350 Nm3/hr)

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MegaTorr® Cryogenic Hydrogen Gas Purifiers

THESE PS7-CR BULK GAS PURIFIERS EFFICIENTLY REMOVE NUMEROUS IMPURITIES WITH HIGH RELIABILITY, LOW COST, AND HIGH PERFORMANCE.

Uses an adsorption process to provide ultra-high purity hydrogen (H2) gas for semiconductor applications.
Two adsorber vessels alternate between purify and regeneration modes, providing continuous purification.
Adsorber regeneration is accomplished by back flushing with purified H2 at an elevated temperature.
Optimized design provides sub-ppb performance in small footprints with flow rates up to 16,667 slpm (1,000 Nm3/hr).

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MegaTorr® Palladium Hydrogen Gas Purifiers

OUR PD SERIES ADVANCED PALLADIUM GAS PURIFIERS OFFER TWO TO THREE TIMES HIGHER CAPACITY THAN OTHER MODELS, WITH LOWER COST AND IMPROVED DURABILITY FOR HIGH-VOLUME MANUFACTURING PROCESSES.

Palladium acts as a catalyst causing hydrogen (H2) gas molecules to dissociate into atoms upon contacting the membrane surface.
The atoms are small enough to diffuse through the palladium membrane, driven by differential H2 pressure across the membrane, they then recombine into molecules after passing through the membrane.
Palladium provides a solid barrier with no breakthrough as compared to catalysts and getters that rely on chemical reactions on reactive surface areas.
Optimized design provides sub-ppb performance in small footprints with flow rates up to 2,170 slpm (130 Nm3/hr).
Includes models PS7-PD05, PS7-PD1, and PS7-PD2 with various flow capabilities for all your application needs.

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MegaTorr® Adsorber and Getter Hydrogen Gas Purifiers

THESE PS7-H BULK GAS ADSORBER AND GETTER BEDS EFFICIENTLY REMOVE NUMEROUS IMPURITIES WITH HIGH RELIABILITY, LOW COST, AND HIGH PERFORMANCE.

Uses a combination of heated getter and ambient catalytic adsorption processes to provide ultra-high purity hydrogen (H2) gas for semiconductor applications.
Two ambient temperature adsorber vessels remove water (H2O), oxygen (O2), CO, and CO2, while the downstream getter vessel, operated at an elevated temperature, eliminates nitrogen (N2) and methane (CH4).
Two adsorber vessels alternate between purity and regeneration mode, providing continuous purification.
Adsorber regeneration is accomplished by back flushing with purified hydrogen at elevated temperatures.
Optimized design provides sub-ppb performance in small footprints with flow rates up to 3,333 slpm (200 Nm3/hr).

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MegaTorr® Catalyst and Adsorber Oxygen Gas Purifiers

THESE PS6 BULK GAS PURIFIERS EFFICIENTLY REMOVE NUMEROUS IMPURITIES WITH HIGH RELIABILITY, LOW COST, AND HIGH PERFORMANCE.

Uses dual catalytic and adsorption processes designed specifically to provide ultra-high purity gas for semiconductor applications.
Hydrocarbons (CH4), carbon monoxide (CO), and hydrogen (H2) react at elevated temperatures with oxygen (O2) in the oxidizing catalyst vessel to form carbon dioxide (CO2) and water (H2O), which are then removed in the ambient temperature adsorber vessel.
Two adsorber vessels alternate between purify and regeneration modes, providing continuous purification.
Adsorber regeneration is accomplished by back flushing purified O2 at an elevated temperature.
Optimized design provides sub-ppb performance in small footprints with flow rates up to 16,667 slpm (1,000 Nm3/hr).

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MegaTorr® Catalyst and Adsorber Nitrogen Gas Purifiers

THESE PS9 BULK GAS PURIFIERS EFFICIENTLY REMOVE NUMEROUS IMPURITIES WITH HIGH RELIABILITY, LOW COST, AND HIGH PERFORMANCE.

Uses dual catalytic and adsorption processes designed specifically to provide ultra-high purity gas for semiconductor applications.
Hydrocarbons (CH4), carbon monoxide (CO), and hydrogen (H2) react at elevated temperatures with oxygen (O2) or extreme clean dry air (XCDA®) in the oxidizing catalyst vessel to form carbon dioxide (CO2) and water (H2O), which, along with O2 are then removed in the ambient temperature adsorber vessel.
Two adsorber vessels alternate between purify and regeneration modes, providing continuous purification.
Adsorber regeneration is accomplished by back flushing with a mixture of purified process gas and low concentration H2 at an elevated temperature.
Optimized design provides sub-ppb performance in small footprints with flow rates up to 200,000 slpm (12,000 Nm3/hr).

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MegaTorr® Auto Regenerable Carbon Dioxide Gas Purifiers

THIS FAMILY OF PS31, PS32, AND PS33 BULK GAS PURIFIERS EFFICIENTLY REMOVES NUMEROUS IMPURITIES WITH HIGH RELIABILITY, LOW COST, AND HIGH PERFORMANCE.

Uses an adsorption process designed specifically to provide ultra-high purity gas for semiconductor applications.
Dual adsorber vessels alternate between purify and regeneration modes, providing continuous purification.
Adsorber regeneration is accomplished by back flushing with nitrogen (N2), hydrogen (H2), or process gas at elevated temperatures.
The Model PS33 also includes a heated catalyst vessel that converts total hydrocarbons (THC), H2, and carbon monoxide (CO) into carbon dioxide (CO2) and water (H2O).
Optimized designs provide sub-ppb performance in small footprints with flow rates of 0-8,333 slpm (500 Nm3/hr).
Available in PS31, PS32, and PS33 configurations to remove specific gases for your application

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MegaTorr® Auto Regenerable XCDA® Gas Purifiers

THESE PS22 AUTOMATICALLY REGENERABLE, BULK GAS PURIFIERS EFFICIENTLY REMOVE NUMEROUS IMPURITIES WITH HIGH RELIABILITY, LOW COST, AND HIGH PERFORMANCE.

Uses ambient temperature adsorption processes designed specifically to provide ultra-high purity extreme clean dry air (XCDA®) for semiconductor applications.
Optimized design provides sub-ppb performance in small footprints with flow rates up to 250,000 slpm (15,000 Nm3/hr).
Outlet impurity levels for water (H2O) and trace impurities including TOC’s (C7+), amines, ammonia, siloxanes, sulfurs, refractory compounds, phthalates, carboxylic acids, and NOx are reduced to below ppb levels.